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The formation of structures with microscale and nanoscale dimensions is important to the fabrication of microscale and nanoscale components and devices. As an example, microscale and nanoscale patterns of the semiconductor, semiconductor-insulator, and semiconductor-metal type are important in the fabrication of integrated circuits, displays, and other microscale and nanoscale structures. The particular application, type, and geometry of the pattern formed depend on the desired function of the device and can affect its performance. For example, the geometry and dimensions of nanoscale interconnects in a nanoscale integrated circuit is critical to the performance of the device. The use of electron beams, such as those produced by field emission guns (e.g., Spindt-type and carbon nanotube based) and scanning tunneling microscopes (STM) to fabricate microscale and nanoscale patterns has been discussed previously. 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