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The formation of structures with microscale and nanoscale dimensions is important to the fabrication of microscale and nanoscale components and devices. As an example, microscale and nanoscale patterns of the semiconductor, semiconductor-insulator, and semiconductor-metal type are important in the fabrication of integrated circuits, displays, and other microscale and nanoscale structures. The particular application, type, and geometry of the pattern formed depend on the desired function of the device and can affect its performance. For example, the geometry and dimensions of nanoscale interconnects in a nanoscale integrated circuit is critical to the performance of the device. The use of electron beams, such as those produced by field emission guns (e.g., Spindt-type and carbon nanotube based) and scanning tunneling microscopes (STM) to fabricate microscale and nanoscale patterns has been discussed previously. The nanotubes of an STM are scanned over the surface of the sample being patterned to form an atomic-scale depression in the resist film where the tip of the STM is positioned. The depression, or nanocavity, is formed from a subsequent removal of resist. Using an STM to form nanocavities has the disadvantage of requiring extremely precise alignment of the STM tip with the surface. Field emission microscopes (FEM) are similar in operation to STMs, in that a tip is scanned over the surface of the sample being patterned, EarTrumpet 2.1.9.0 Download 8e68912320 EarTrumpet 2.1.9.0 Crack KEYMACRO KeyPlus: Start macro recorder, Macro recorder, start/stop macro recorder, Stop macro recorder, clear macro recorder, set default layout, all (keymappings), calculate the keymappings automatically. 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